纳米压印光刻技术综述_魏玉平

·87·266033。TG580AOverviewofnano－imprintingtechnologyWEIYupingDINGYuchengLIChangheCollegeofMechanicalEngineeringQingdaoTechnologicalUniversityQingdao266033CHNAbstractInthispapertheprocessesaredescribedfirstlyandthenthetraditionalandstate－of－the－artsreviewispresented．Furthermorethekeytechniquesinvolvedinthenano－imprintlithographyandthetechnicalchallengesfacedinapplicationofthisprocessforfabricatingtheintegratedcircuitarediscussed．KeywordsNano－imprintLithographyKeyTechniquesTechnicalChallenge1947。18～24。。。nano－imprintlithogra-phyNIL。NILStephenY．Chou1。。2。。NIL5nm。NIL、。NextGenerationLithographyNGL3。NIL、NIL200516nm。。、、、、、、PaulSchemer、、。MolecularImprintsInc、NanonexCorpEVGroupObducatABSussMicrotecCo．Inc。。、、、、·88·、、。1。。。。3、、。1．1HotEmbossingLithographHEL1。EBDWSiSiO2PMMAGlassTransferTemperature110℃、。PMMA。4。、5～30nm5。1．21999。。。UltraVioletNanoImprintlithographyUV－NILSiO2Si400～500nm、、。2。UV。·89·。50nm。。。10nm。1．3MicroContactPrintingμCP。。。PDMSPDMS10～20sSAM。SAM。35nm。3。6。4。PDMS。PDMS。1．4NIL3。SiCu、AlAu。MPa。1%2～40MPa7。5。8。。。Si10nm6。。·90·。。———9。、、。7。。。。。。。23①②③。、、。、、、。。8。。2．1。。。、、、、、。Si、SiO2、Ni、PDMS。。。2．1．1。。PMMA0.3～1.0nm、PMMACrCr·91·SiSiO24。。。。2．1．211。9。2．1．312。10。2．1．413。11a11b3D11c。、、、、14。、、、、4。2．2、。、、。。。。。。。·92·。PM-MA15－16、PS17、PC18－1920。。、。。、PDMS。。4、、、。、、。。。、、、。、、。12。、、21。2．3。。。。。。。KOH、EDPEthyl-enediaminePyrocatecholTMAHTrimethylAmmoni-umHydroxideHF、HNO3、CH3COOH22。。。。、、、、。22。2．4。。。。。·93·。。。。。、。。。、23。CF3CF25CH22SiCL3CF3CH2CH2SiCL3－CF34。PTFE。3。。、、、、、。10nm11。32nm。、2。。。UVUV。。2。。、。、、、、。。、、。·94·。1/5～1/3100nm30nm。。。、。。20nm10。45nm、、IC。、、、、、。、、、。3。1PiaszenskiGBarthURudzinskiAetal．3DstructuresforUV－NILtemplatefabricationwithgrayscaleebeamlithographyJ．Microelec-tronicEngineering2007845－8．2．J．20103119－15．3GuoLJ．RecentprogressinnanoimprinttechnologyanditsapplicationsJ．J．Phys．DAppl．Phys．200437R123－R141．4．J．20094561－13．5ZhangWChouSY．Fabricationof60－nmtransistorson4－in．WaferU-singnanoimprintatalllithographylevelsJ．Appl．Phys．Lett20038381632－1634．6WilburJLKumarA－BiebuyekHAeta1．Microcontactprintingofself—assembledmonolayersapplicationsinmicrofabrieationJ．Nanotedmology19967452－457．7．J．2009305253－257．8ChouStephenYKeimelChrisGuJian．UltrafastanddirectimprintofnanostructureinsiliconJ．Nature2002417835－837．9LanShuhuaiLeeHyejinNiJunetal．Surveyonroller－typenanoim-printlithographyRNILprocessC．InternationalConferenceOnSmartManufacturingApplicationGyeonggi－doKorea2008．10．M．2012．11NieZHKumachevaE．PatterningsurfaceswithfunctionalpolymersJ．NatureMaterials200874277－290．12HuoFZhengZZhengGetal．PolymerpenlithographyJ．Sci-ence200832158961658－1660．13LiXLWangQKZhangJetal．Largeareanano－sizearraystampforUV－basednanoimprintlithographyfabricatedbysizereductionprocessJ．MicroelectronicEngineering200986102015－2019．14．J．MENMS20104712725－726．15SchulzHScheerHCHoffmannTetal．NewpolymermaterialsfornanoimprintingJ．JournalofVacuumScienceandTechnologyB20001841861－1．16GourgonCPerretCMicouinG．Electronbeamphotoresistsfornano-imprintlithographyJ．MicroelectroNicEngineering200261/623．17HuWCrouchASMillerDetal．Inhibitedcellspreadingonpoly-styrenenanopillarsfabricatedbynanoimprintingandinsituelongationJ．Nanotechnology201021383．18HarutakaMToshihikoNHiroshiGetal．NanoimprintlithographycombinedwithultrasonicvibrationonpolycarbonateJ．JapaneseJournalofAppliedPhysics2007469B6355－6362．19YuCCChenYTWanDHetal．Usingone－stepdual－sidenano-imprintlithographytofabricatelow－costhighlyflexiblewaveplatesexhibitingbroadbandantireflectionJ．JournaloftheElectrochemicalSociety20111586195－199．20ChoiPFuPFGuoLJ．Siloxanecopolymersfornanoimprintlithog-raphyJ．AdvancedFunctionalMaterials200717165．21．J．200862148－156．22．M．2005．23TsibouklisJNevellTG．Ultra－lowsurfaceenergypolymersthemolecu-lardesignrequirementsJ．AdvancedMaterials2003157/8647－650．2012－03－28120827。