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孙喜莲洪瑞金齐红基范正修邵建达(,,201800)(200562;2006219)K982nm1072nmAg,X.:Ag,;,,.:550nm,175nm,,n,k;175nm,nk.:,,,PACC:7820D,7865,7360D1引言,.,Ag(095,099),.,Ag.[1].,.Ag_Au_SiO2[2],Ag_BaO[3],Ag_SiO2[4],Ag_MgF2[5],Ag_SiO2_Si[6]..[79],.,.,.,,.()(),.,.,..2实验21Ag.Ag9999%,70mm,4mm.1mm30mmK9,,.,140mm.,Alpha_Step500,05nm...(Ar)9999%.1810-3Pa,03Pa,.320V,005A,206nmmin,4min,85min,13min,20min,25min,52min.22221光谱测试PERKINELMERLambda_900,Ag420nm5592006910003290200655(09)492305ACTAPHYSICASINICAVol.55,No.9,September,20062006Chin.Phys.Soc.680nm.Lambda_900500nm000005,00007Ah,008nm,0001A,000008%T,0002ABS.222微结构测试MXP18AHFX,CuK,.21090,002.223光学常数测定,[10].,,.[11]TexpRexp.TcalcRcalc(n,k)d,:Tcalc(n,k,d,)=Texp(),(1)Rcalc(n,k,d,)=Rexp().(2)(1)(2),,,,n()k().1,e,h(h0),t(0t1),.13结果与讨论31282nm,175nm,268nm,412nm,515nm1072nm550nm.2,268nm,,;268nm,;515nm1072nm,.,,,,.,82nm268nm,;268nm515nm,492455;515nm1072nm,,,,.2550nmAg,:.,,,,.,,,;,,,,,.,,,;,,,,,.1minnm()()nmnmAg313268079838098101603888Ag420412077738131104703595Ag525515074238133109603578Ag6521072073638153110803423323AgX.,Ag,.,3XRD(111),,001325.(Scherrersformula),D=k(cos),(3)k09,=0154056nm,,.(111),(3)Ag.(4)(111).1.,,,82nm175nm,.2dsin=CuK.(4)1,,(111),,268nm1072nm,1018nm11nm.,,.,,(4),,,(111).,(d=02359nm),.X,49259:,,[12].,,,;Ag,.Ag,,,,Ag,.,,,,Ag...s,[13]Daa=-4s3ED,(5)E.,s,.33,,n()k(),nk,550nmn,k4.4,(1)175nm,,n,k;(2)175nm1072nm,n,,k,515nm1072nm,k02,.Ag,,Ag(),Ag.,,,,,,n,k.,,,4550nm,nk,,.,,,,,[14].n,k.,,.,,,,,nk.,k515nm1072nm,.4结论1K982nm1072nmAg.Ag,,,,.2,550nmnk.:175nm,,n,k;175nm1072nm,nAg,,k515nm1072nm,..492655,,,.[1]YangYuwang,LiuJingli.2003IndustrialCatalysis117(inChinese)[2003117][2]XieZB,WangQQ,ZhouZGetal1999J.WuhanUniv.4584(inChinese)[19994584][3]LiLJ,WuJL1998ActaOpticaSinica181551(inChinese)[1998181551][4]GranqvistCG,HunderiO1978Phys.Rev.B182897[5]SunZQ,SunDM,LiAXetal1999Vacuum52243[6]ZhouP,YouHY,WangSYetal2002ActaPhys.Sin.512276(inChinese)[2002512276][7]SchulzLG1954JOptSocAmer44357[8]FhrenreichH,PhilippHR1962Phys.Rev.1281622[9]PalikED1985HandbookofOpticalConstantsofSolids(Orlando:AcademicPress)p353[10]JohnsonPB,ChirstyRW1972Phys.Rev.B64370[11]JinYH1999Ph.M.Thesis(ShanghaiInstituteofOpticsandFineMechanics)p12(inChinese)[1999()12][12]AMehner,HKlmper_Westkamp,FHoffman1997ThinSolidFilms,308309,363[13]WuGF,SongXP,YangCHetal2003FunctionalMaterials6682(inChinese)[20036682][14]FanP,QiHJ,YiKetal2004VacuumScienceandTechnology24100(inChinese)[200424100]MicrostructureandopticalconstantsofsputteredAgfilmsofdifferentthicknessSunXi_LianHongRui_JinQiHong_JiFanZheng_XiuShaoJian_Da(Research&DevelopmentCenterforOpticalThinFilmCoatings,ShanghaiInstituteofOpticsandFineMechanics,ChineseAcademyofSciences,Shanghai201800,China)(Received2June2005;revisedmanuscriptreceived19February2006)AbstractAgfilmswithdifferentthicknessfrom82nmto1072nmwerepreparedbyDCsputteringdepositionandanalyzedbyX_raydiffractionwiththehelpofoptimizationprogramoncomputer.Microstructrueanalysisshowsthatthefilmsaremadeoffcc_Agparticles.Withtheincreaseofthickness,themeansizeofAgparticlesincreasesandtheinterplanerspacingdecreasesgradually.Theopticalconstantscomputedbycomputerprogramshowsthatnvaluedecreasesquicklywiththeincreasingthicknessbelow175nmandkvaluechangesinreverse,andthengosteadilywhenthethicknessislargerthan175nmatthewavelengthof550nm.Keywords:DCsputteringdeposition,Agfilms,microstructrue,opticalconstantsPACC:7820D,7865,7360D49279:
本文标题:磁控溅射不同厚度银膜的微结构及其光学常数
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