特种气体在电子行业中的应用

(,56201108):,:;;;;:TQ117:A:100727804(2009)0220001204TheApplicationofSpecialtyGasesinElectronicsIndustriesLIDong2sheng(ShanghaiGenTechUHPCo.,Ltd.,56ChunzhongRoad,Shanghai201108,China)Abstract:Thisarticleintroducestheapplicationofspecialtygasesinelectronicsindustries,suchasintegratedcircuit,so2larcell,compoundsemiconductor,TFT2LCDandopticalfiberperform.Safetyrecommendationsarealsogivenoutduringusage.KeyWords:specialtygas;electronics;semiconductor;application;safety02040(),50,,,,(99199999%),,,,1111/,,(),1Fig11Frontprocessforsiliconwafersmanufacturing(1)272Vol127,No1220094LowTemperatureandSpecialtyGasesApr1,2009:2009202203©1994-2009ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.(CVD),:SiH4DCSTCSSiCl4TEOSNH3N2OWF6H2O2:SiH4+O2SiO2+H2SiH4Si+H2SiH4+NH3Si3N4+H2SiH4+N2OSiO2+N2+H2TEOS+O3SiO2+H2O+CO2DCS+NH3Si3N4+HCl+H2113,,(),CF4CF4/O2SF6C2F6/O2NF3,,(Cl2)(Br2HBr)SiF4SiCl4SiBr4,CCl4Cl2BCl3AlCl3114,,pnp()(),,,,,,pp,n()(),,,nn,,IIIVB2H6BBr3BF3,PH3POCl3AsH3SbCl522111839EBecquerel()1954,,pn,np,pn,()(),()(),,,1958,,227©1994-2009ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.:POCl3+O2P2O5+Cl2P2O5+SiSiO2+PSiH4+NH3SiNx:H+H2CF4+O2+SiSiF4+CO2213(a2Si)/(a2Si/c2Si)(TCO)LPCVDPECVDpinLPCVDTCODEZnB2H6;/SiH4PH3/H2TMB/H2CH4NF3:Zn(C2H5)2+H2OC2H6+ZnOSiH4+CH4a2SiC:H+H2SiH4a2Si:H+H23311IIIV,,GaAsInPGaNAlGaAs(LED)(GPS)(HBTHEMT)(UV)312MOCVD/LED(MOCVD)1968(LED)IIIV,GaAs()GaP()GaAsP(),pnpn,,,,,np,pn2MOCVDFig12MOCVDmanufacturingmodelLEDMOCVD;LEDpn,;,LEDMOCVDAsH3PH3NH3N2H22BCl332:©1994-2009ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.()/LCD()TFT,,,412TFT/LCDTFT/LCDTFT()(),,SiO2SiNxa2Sina2SiSiH4PH3NH3NF3,SF6HClCl25511,80%SiO2,SiCl4,,(ITU),(G1651,)(G1652)(G1653)(G1654)(G1655/G1656,)512,:,(OVD)(VAD)(MCVD)(PCVD),(Core2rod);(Over2cladding),SiCl4GeCl4,SiO2GeO2(SOOT)SiCl4GeCl4,CH4CF4Cl2SF66,,,,,,,,,,,,,,,,:[1][]OUIRKMichael,SERDAJulian.[M].,,.:,2004.[2],.[M].:,2008.[3].[M].:,2003.:(19682),,,,427©1994-2009ChinaAcademicJournalElectronicPublishingHouse.Allrightsreserved.