PECVD工艺流程已修改

毕业设计（论文）（2012届）题目等离子增强化学气相沉积(PECVD)的工艺流程学号0903010033姓名董庆所属系新能源科学与工程学院专业材料工程技术班级09材料工程技术班指导教师阮仔龙新余学院教务处等离子增强化学气相沉积（PECVD）的工艺流程1目录摘要·······························································································································2Abstract·······················································································································2第1章PECVD的概述·······························································································31.1PECVD的发展·······························································································31.2PECVD的工作原理·······················································································41.3PECVD设备的主要作用···············································································41.4PECVD的优点·······························································································71.5PECVD的特点·······························································································7第2章PECVD的结构组成，主要的性能指标参数··············································82.1PECVD的组成结构·······················································································82.2PECVD的主要性能指标参数·······································································9第3章PECVD的设备安装，调试·········································································113.1PECVD设备的安装和调试工作·································································113.2设备调试前的检查工作···············································································123.3设备的调试···································································································12第4章PECVD的工艺·····························································································154.1工艺过程·······································································································154.2原材料及注意事项·······················································································154.3工艺操作规范·······························································································164.4安全···············································································································164.5PECVD设备的故障分析·············································································174.6PECVD的维护保养·····················································································184.7PECVD工艺流程中主要参与的化学方程式·············································194.8PECVD中的应力控制·················································································20第5章PECVD的未来与展望·················································································21参考文献·····················································································································22致谢···························································································································23等离子增强化学气相沉积（PECVD）的工艺流程2等离子增强化学气相沉积的工艺流程摘要随着太阳能利用的日益广泛光电转换将越来越受到人们的关注。在太阳能电池片的生产过程中，与很多因素有至关重要的关系，PECVD是其中的关键技术之一是影响着太阳电池质量的一个重要因素，PECVD是其中不可或缺的重要组成部分。文章着重讨论PECVD的工艺流程，原理，应用，结构，制备，保养，注意事项和PECVD的未来发展。关键词：太阳电池；PECVD；氮化硅；SiNx；反射率；减反射率；薄膜PlasmaenhancedchemicalvapordepositionprocessAbstractWiththeincreasinglywideutilizationofsolarenergyphotoelectricconversionwillbemoreandmorepeople'sattention.Thesolarbatteryplateproductionprocess,andmanyfactorshaveimportantrelations,PECVDisoneofthekeytechnologiesofsolarcellsisanimportantfactorinthequality,PECVDisoneoftheindispensableimportantcomponent.ThisarticlediscussesthePECVDtechnologicalprocess,principle,application,structure,preparation,maintenance,mattersneedingattentionandthefutureofPECVDdevelopment.Keywords:SolarCell;PECVD;SiliconNitride;SiNx;Reflectivity;ReducingReflectivity;Thinfilm等离子增强化学气相沉积（PECVD）的工艺流程3第1章PECVD的概述1.1PECVD的发展随着环境的日益恶化以及资源逐渐的匮乏，人类正在寻找环保的,取之不尽用之不竭的新型能源。根据科学家们的研究表明，太阳能是使用起来最为清洁，资源充足的新型能源之一。就目前的发电技术而言，在我郭使用最为广泛的就是火力发电和风力发电，但是它们在发电过程中有很大的弊端，例如火力发电消耗的煤炭能源比较多，而且污染性很大；风力发电虽然较为清洁，但是在我国大部分地区发电量很少。于是乎，世界上各个国家都开始寻找新的对策，在许多国家，比如德国使用太阳能发电的覆盖率很高，我国也在大力推广光伏行业，并且在未来几年内我国将太阳能发电技术逐步取代其他形式的发电技术。在使用太阳能发电过程中有几个优势，使用效率较高，成本低，无污染，能源取之不尽用之不竭。这些优势就决定了光伏产业必将被广泛推广，必将取代其他能源形式的发电技术。在太阳能发电过程中太阳能电池片是其中的核心之一，还有在太阳能电池片的生产过程中，PECVD（等离子增强化学气相沉积）是其中的关键技术之一。它具有沉积速度快，膜层质量好等特点。与其它镀膜技术相比，PECVD集成了真空，化学，物理，机械，电气，高频等各方面的技术，是一个较为复杂的系统。在设备研究方面，主要解决低温稳定性，粉尘污染，气路气密性，高频辉光放电，全自动计算机控制等技术问题；在工艺研究方面，主要解决膜厚均匀性，工艺重复性，光电转换效率等技术问题。PECVD由于其等离子密度高，热均匀性好，产量大，沉积温度低，污染小等特点被广泛的应用。PECVD设备主要的应用是在集体表面的镀膜技术上，目前市场上用的PECVD设备，国外的主要有德国centrotherm和日本岛津的镀膜设备；国内主要有生产型管式PECVD。尽管有许多优点，但仍存在不足，一是经济成本，二是技术成熟度。在技术上，等离子体增强化学气相沉积无论是反应装置还是工艺都有待改进和完善。不过随着研究的深入，等离子体增强化学气相沉积技术必将不断发展和成熟。等离子增强化学气相沉积（PECVD）的工艺流程41.2PECVD的工作原理PECVD系统是一组利用镀膜舟和高频等离子激发器的系列发生器，在低温和升温的情况下，等离子发生器直接装在镀膜板中间发生反应。利用的活性气体为硅烷和氨气。这些气体作用于储存在硅片上的氮化硅。可以根据改变硅烷对氨气的比率，来得到不同的折射指数，在沉积工艺中，伴有大量的氢原子和氢离子的产生，使得晶片的氢钝化性十分良好。PECVD的技术原理是利用低温等离子体作为能量源，样品置于低气压下辉光放点的阴极上，利用辉光放电（或另加发热体）使样品升温到预定的温度，然后通过适量的反应气体，气体经过一系列化学反应和等离子体反应，使得样品表面形成固态薄膜。化学方程式为：3SiH4+4NH3SiN4+12H2(200℃-400℃，50-300Pa的条件下）理想反应：SiH4•(gas)+NH•(gas)→SiNx:Hy+H21.3PECVD设备的主要作用PECVD集