Al3SiO2共掺杂TiO2光催化膜的制备及超亲水改性

39620116NEWCHEMICALMATERIALSVol39No6105:(1985-),,,TiO2:,,,,Al3+SiO2TiO2崔晋梅郭宪英*逄奉建(青岛大学化学化工与环境学院,青岛266071)为了提高TiO2光催化薄膜的利用效率,实验采用金属离子Al3+和氧化物SiO2共掺杂的方法,制备以TiO2为基体的复合光催化薄膜利用简单易行的溶胶凝胶法结合超声分散技术以两种不同的方式,一种是同步将Al3+和SiO2共掺杂于TiO2溶胶中,制备多元素共掺杂混合溶胶,采用浸渍提拉的方法以玻璃片为载体涂膜,然后运用马弗炉进行热处理制得产品另一种是利用SiO2对Al3+掺杂TiO2进行表面处理改性,热处理后制得产品将所得产品进行接触角紫外可见分光光度计红外SEMAFM测试,对其性能进行表征结果表明:Al3+掺杂量为0.3g时,TiO2复合光催化膜效果最好;经过SiO2表面处理过的Al3+/TiO2复合光催化膜的超亲水性最好;Al3+掺杂TiO2提高了其吸光性能;复合光催化膜的透过率可达80%~90%,透明度较高溶胶凝胶法,TiO2光催化膜,共掺杂,改性PreparationandsuperhydrophilicmodificationofAl3+SiO2codopingTiO2photocatalyticfilmCuiJinmeiGuoXianyingPangFengjian(CollegeofChemicalandEnvironmentalEngineering,QingdaoUniversity,Qingdao266071))AbstractToimprovetheTiO2photocatalyticthinfilmefficiency,theexperimentusedmetalionsAl3+andSiO2dopingtopreparethecompositeTiO2photocatalyticfilm.Usingasimplesolgelandultrasonicdispersionintwodifferentways,onewassynchronizedAl3+andSiO2dopedTiO2solwaspreparedbymultielementdopedhybridsol,bydipping,glassasthecarrierfilm,andthenusingamufflefurnaceforheattreatmentobtainedproducts.OnewastheuseofSiO2surfacetreatmentmodificationtheAl3+dopedTiO2film,afterheattreatmentwereproducts.Thefinalproductwillbetestedbythecontactangle,UVVis,IR,SEMandAFMtocharacterizeitsperformance.TheresultsshowedwhentheAl3+dopingcontentof03g,TiO2compositephotocatalytisfilmwasbest;throughtheSiO2surfacetreatedAl3+/TiO2compositephotocatalyticfilmsuperhydrophilicitywasbest;Al3+dopedTiO2toimprovetheperformanceofitsabsorption.TransmittanceofCompositephotocatalyticfilmwasupto80%-90%,theyhadhigherdegreeoftransparency.Keywordssolgelmethod,TiO2photocatalyticfilm,doping,modificationTiO2,,,[14],TiO2,,TiO2TiO2:,,;TiO2TiO2TiO2[5]TiO2TiO2,,,,TiO2,,,,TiO2,TiO2,TiO2(),(),,;,TiO2,,,TiO2[6]TiO2,,,TiO2;,,TiO2[78][9]39NTiO2,N/TiO2Pt(0.5),PtNTiO2,,PtNTiO2TiO220nm,400~500nm,NTiO2,,Pt,,,PtN,TiO2,,[910]Al3+/SiO2TiO2,,,11.1(TBOT),;(TEOS),;,,;,;,:SX2413,;:SK3300H,;:MAGNAIR550,Nicolet;:JSM6390LV,JEOL;:CSPM3000,;:ZK82A,;:D971,;:AL104,();:UV757,;XD8Advance:(BRUKER);:;:;:1.21.2.1混合溶胶的制备Al3+TiO2:,20mL1,2mL,,A1;20mL2,Al(NO3)32,2mL,pH,B1;A1B1,B1A1,05h,C11hAl3+/SiO2/TiO2:C1,SiO2,2hD11.2.2复合光催化膜的制备,,3mm/s,,10030min,,1.2.3复合光催化膜的超亲水改性SiO2Al3+TiO21.2.4对比试验,Al3+01g02g03g04g05g,SiO21.2.5性能测试FTIR,,,22.1Al3+5Al3+TiO2(1a),5Al3+TiO2(1b)(1c),Al3+1066:Al3+SiO2TiO21a,03gAl3+TiO2,,;Al3+,,1b,03gAl3+TiO2;1c,03gAl3+TiO2:0.3gAl3+TiO2,Al3+TBOTH2OC2H5OH=31620286(),2.21.5L,,,222,Al3+TiO2TiO220,Al3+/SiO2/TiO2,10,,bc;Al3+/TiO2SiO2,,0,,SiO2Al3+/TiO2,0,,33(a:TiO2;b:Al3+/TiO2;c:Al3+/SiO2/TiO2;d:Al3+/TiO2+SiO2)2.3,,44a4a:(1)(190~400nm):190nm~300nm,Al3+/TiO2,TiO2,SiO2Al3+/TiO2,TiO2;300~400nm,TiO2,360nm12,Al3+/TiO2TiO2,,SiO2Al3+/TiO2,340nm(2),Al3+/TiO2,TiO2,:Al3+TiO2,TiO2,SiO2Al3+/TiO2,4b4b,,TiO260%~70%,Al3+/TiO2TiO2,80%~90%,,500nm,34,SiO2Al3+/TiO2,90%,SiO2Al3+/TiO280%~90%,2.4,SiO2/TiO2Al3+/TiO2Al3+/10739SiO2/TiO2,55SiO2/TiO2Al3+/TiO2Al3+/SiO2/TiO25,13400cm-1SiOH,2,33400cm-1TiO2OH;1630cm-1TiO2OH1380cm-1,CO,500~1250cm-1OTiO1183cm-1953cm-1TiOC683cm-1C=O510cm-1[TiO6],TiO2,Al3+,,23,312,Al3+/SiO2/TiO2,,2.5,Al3+/TiO2+SiO2AFM,66Al3+/TiO2+SiO2AFM6,SiO2Al3+/TiO2,10nm,,,3(1)Al3+0.3g,TiO2(2)SiO2Al3+/TiO2,,0,Al3+/SiO2/TiO2(3)Al3+TiO2,TiO2,SiO2Al3+/TiO2,80%~90%,[1],,.TiO2[J].,2002,(4):13.[2],,,.[J].,2004,24(3):180183.[3],,,.TiO2[J].,2008,20(1):7678.[4],,,.TiO2[J].,2007,36(2):183187.[5]SongShu,JingLiqiang,LiShudan,eta1.SuperhydrophilicanalaseTiO2filmwiththemicroandnanometerscalehierarchicalsurfacestructure[J].MaterialsLetters,2008,62(20):35033505.[6]DomaradzkiJ.Structural,opticalandelectricalpropertiesoftransparentvandPddopedTiO2thinfilmspreparedbysputtering[J].ThinSolidFilms,2006,497(12):243248.[7]YangT,HideoN,TetsuT.VisiblelightinducedpatterningofAgandAgTiO2nanocompositefilmsurfacesonthebasisofplasmonphotoelectrochemistry[J].Photochemical&PhotoboilogicalSciences,2005,4:598601.[8]DaYungW,HsiaoChengL,ChungChihInfluenceofmetalplasmaionimplantationonphotosensitivityofanataseTiO2thinfilms.ThinSolidFilms,2006,515(3):10471052.[9],,,.Pt,NTiO2[J].,2005,2(10):10811085.[10],,.TiO2[J].,2006,22(9):17231727.:20101104:20101207108