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SecondBaosteelBiennialAcademicConference(BaosteelBAC2006)SpotlessArcActivatedReactiveLargeAreaEB-PVDofTitaniumOxideandTitaniumNitrideC.Steuer1),E.Reinhold1),C.Metzner2),B.Scheffel2)1)VONARDENNEANLAGENTECHNIKGMBHPlattleite19/29,D-01324Dresden,Germany2)FraunhoferInstitutElektronenstrahl-undPlasmatechnikWinterbergstra.e28,D-1277Dresden,GermanyAbstractPlasmaactivationofelectronbeamphysicalvapordeposition(EB-PVD)allowstoincreasedensity,hardness,refractiveindexandotherpropertiesofevaporatedcoatings.Thiscontributionreferstoreactivespotlessarcactivateddeposition(SAD)ofcoatingsfromthetitaniumcompoundsTiO2andTiN.ElectronbeamevaporationiscombinedwiththeignitionofaspotlessarcdischargeontheEBheatedtitaniummetalandadditionalprocessgasinlet.Theprocesscombinationhasbeenextendedtolargeareadimensions.Achievedlayerproperties,coatingratesandlayerthicknessdistributionsonlargesubstrateswillbepresented.ThetechnologicalcapacityofreactivelargeareaSADwillbeconsideredwithregardtoadvantageousapplications.
本文标题:39-abstract-Spotless Arc Activated Reactive Large
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