镀铬溶液各成分的影响

镀铬溶液各成分的影响（1）CrO3：它溶于水生成H2CrO4，提供Cr3＋。CrO3含量一般控制在150～400g/L。CrO3浓度低时，电流效率高，硬度高，分散能力好，缺点是导电率低，槽压高。CrO3浓度高时则相反。在生产中，防护装饰性镀铬溶液一般采用300g/LCrO3左右，耐磨镀铬为250g/L以下。CrO3:itsolubleinwater,provideCr3+H2CrO4generation.CrO3contentgeneralcontrolin150~400g/L.CrO3lowconcentration,thecurrentefficiencyhigh,highhardness,gooddispersion,defectistheabilityofconductiverateislow,slothighpressures.CrO3highconcentrationistheopposite.Inproduction,protectionadornmentsex,chromiumplatingsolutiongeneraluseofthe300g/LCrO3orso,wear-resisting,chromiumplatingfor250g/Lbelow.（2）H2SO4：在普通镀铬溶液中，H2SO4含量要与CrO3相配合，应控制CrO3︰SO42-在80～120︰1的范围内，它影响阴极效率、沉积速度、光泽度等。H2SO4:ingeneral,chromiumplatingsolution,H2SO4contenttoCrO3andcoordinates,shouldbecontrolledCrO3:SO42-in80~120:1,withinthescopeofthecathode,anditaffectstheefficiencysedimentaryspeed,glossiness.（3）H2SiF6：SiF62－在电极反应过程中与SO42－作用相似，它可以使电流效率提高19～21％，而标准镀铬溶液为13％。另外对铬层表面有活化作用。H2SiF6:SiF62-intheelectrodereactionprocessandSO42-rolesimilar,itcanmakethecurrentefficiencyimprove19~21%,whilethestandardfor13%chromiumplatingsolution.Inaddition,thechromiumlayersurfacehaveanactivation.（4）三价铬：新制溶液中由于缺少一定量的三价铬离子，镀层效果难以满意。在转入正常生产之前，先要大阴极（小阳极）电解一段时间，在电解时阴极上能产生三价铬离子。三价铬含量一般控制在2～4g/L。要维持这个范围，阳极面积应比阴极面积大一倍左右。cr3+:thenewsystemsolutionduetothelackofacertainamountofcr3+platingeffection,difficulttosatisfaction.Inturntonormalproduction,firstistobigcathode(small)electrolysisanodeforaperiodoftime,whenthecathodeinelectrolyticcanproducecr3+ions.Threepricechromecontentgeneralcontrolin2~4g/L.Tomaintainthisrange,theanodeareashouldbemorethantwiceaslargeasthecathodeareatotheleft.