合金薄膜电阻应变式压力传感器的研究进展_晏建武

/l,22(1,410083;2,33()0:14),,,Devel0PmentandInvestigationTrendsofAlloyThinFilmPiezoresistiveSensorYANJianwu,ZHOUJiehengLUShiqiangZTIANIi(1SchoolofPhysiesScieneeandTeehnology,CentraluthUniversity,Changsha410083)2partmentofMator.Sci.andEng,,NanehangInstituteofAeronautiealTeehnology.Nanehang330()34)AbstraetInthisartiele,thestatusanddevelopmenttrend,thekeyteehnologyandtheapplieationofallr)ythinfilmpiezoresistivessorarereviewed.TheuseofalloythinfilmresistorassensitivelayerinPiezoresistivesonsorovereomestheshorteomingofstiekuppressuresensor.DuetotheirmoreelaboratestruetureandsuPeriorPr()perties.alloythinfilmPiezoresistivesensoreanbeusedinallkindsofharshenvironments.Keywo5alloythinfilm,piezoresistivesensor,developmentO,,199131830,(0.),,,510,10~20,,,,,,20%~30,3000;5000,90%,,,,,,,5,,1993A10nsoA,,1::,,3:2030,Si~nsERugeA.02.05mm,(N()6017043):1965,,Tel:o79x8224689Email:[e-mail]:,,,Tel:[phone]lEmail:[e-mail]322005121912,.,,,,,,0.003~0.01~,(),,,,,,,,,,,,,,:(),,SiA12(,,(SiSi3N;A12),,3:,/,,(5~30MH:),,,:¹;º;»,;¼,;½,,,(100OeV),,,,()(),.,,,(),2(P)),(1),,,:,,,(2),,,3NICr1993,NICrNICrAlonsoANICr50%NisoCr%,30~150C(20XI06)24h150C,50nm40n/2.3,.83,BelLlAEsMTEM10Pa25onrnNIC:(7satNi/22at%Cr),NICr,NiCrNICrSi(111)A(),Au/NICr/Ta,XRI).SEM,AFM.,,:Si(111),,/100250C,~~,,,;A12()3(111),(2()).,,.,,Ni.C:ThomaSXRDAESTEMXFANiTbNitN.26,NiTb,NITbNiTbNit)26,NITbNi1)andH,~300eVAr+,,,3NICr,Klokolm.NICrNICr,NICr,Baunacks[l4NiCr/(LJNi(Mn)/NiC::Ni,Cu,NiCuNi(Mn),NICrCNiCrNiCrNi:,NiCr/CuNi(Mn)N.6C.:C.2ZhouJieheng5]NIC:,N:Si(,673Klh,473K24h.6J,J~J/J,~JJ,.,J~uJJJAu/NICr/TaAu/NICrLC,TIN:,,LeeJH71PtNICr/SiCr,R,Pt,RPt,BroeknerW8NICr/CuNi/NICrCuNi/NIC:,:300,300CNiCuNiNICrR,.TCRi,CuNiNi4,,,,,,.,n.,3100eV,.,,,l0()5()v,,.,,,..r500~2000cV,.,,N:,,,SenstronicS,,.()Si().()Si(,.Si):..Au,:(l)NICr,,,,..(2):¹;º2005121912;»,(3),,;,;;5,,,,MEMS,,,,l,.[J.,2000,25(1):472,,.J.,2000,(:43,,,.J.,2004,26(2):2114,.J.,2001,20(6):155.[J.,2001,(5):236AlonsoA,GarciaE,etal.StrainsensitivityandtemPera-tureinflueneeonsPutteredthinfilmsforPiezoresistivesen-sors[Jj.SensorsandAetuatorsA,1993,(3738):784711Ll,PounK,RemkarAES,AFMandTEMstudiesofNIC:thinfilmfo:capaeitivehumidity,ensors[J.ThinlidFilms,1998,317:1738,,,.(MIC)Au/NICr/TaAFM[J.,2003,23(2):x4o9,,,.Au/NICr/Ta[J].,2003,39(2):27210,,.Au/NICr/TaJ.,2002,38(5):44911ThomasS,HorstH.StrueturalProPertiesofNi/Tbmulti-layersJ.JMagneMater,2002,248:151121randH,SekineK,EtohK,etal.Inf!ueneeofionindueedsurfaeedefeetsonthenueleationandfornlationmeehanismsofmetallithinfilmsJ.SurfCoatTeehn,2000,125:11113,.NICr[J.,2000,(5):914BaunaekS,BrueknerW,PitsehkeW,eral.Augereleetronspectroscopystudyofinterdiffusion,oxidationandsra-tionduringthermaltreatmentofNICr/CuNi(Mn)/NICrthinfilmsJ].ApplSurfSci,1999,144145:21615ZhouJieheng,PengYiqiao,etal.Effeetsofheattret-mentProeessonthinfilmalloyresistaneeanditsstability[J.JntraluthUniversalTeehnology,2003,10(2):9116,,,.Au/NICr/TaAu/NICrJj.,2002,55(4):407171,eeJH.TheeffeerofPtimpurityartheNICr/51interfaeeonthegrowthofamorphousCrlayerduringanneali[J.ThinSolidFilms,1995,256:8518BroeknerW,SchumannJ,BaunaekS,etal.Resistaneebe-haviourandinterdiffusionoflayeredCuNiNIC:filmsJ].ThinlidFi!ms,1995,258:23619.M.:,2004.4720.J.,2001,(4):5721,,,.[J].(),2001,24(5):51622,,,.NICrJ.,2003,24():9123.[J.,1999,(3):29()(2)(MMLRENISHAWÀ234(3)20062006PllZ