FMQA-131A SMT PCB じン絋粄

浙江理工大学学报,第27卷,第2期,2010年3月JournalofZhejiangSciTechUniversityVol.27,No.2,Mar.2010:16733851(2010)02023905:2009-10-12:(50827501):(1984-),,,,CPLD,,,(浙江理工大学纳米测量技术实验室,杭州310018):介绍了激光合成波长干涉纳米位移测量的原理,设计了基于复杂可编程逻辑器件(CPLD)的激光合成波长干涉纳米位移测量信号处理系统,包括信号前置处理电路的设计和CPLD信号处理模块的设计采用VisualBasic自带的MSComm控件实现了PC机与CPLD之间的通信,对实验过程进行了实时监控在恒温恒湿条件下,分别以5nm和10nm为步长进行了位移测量实验,实验结果表明:在测量镜移动0~200nm范围内,测量结果线性相关系数分别为0.9991和0.9998,标准偏差分别为1.85nm和2.54nm,验证了所设计的信号处理系统能够实现纳米级位移测量精度的要求,具有较高的可靠性和实用性:激光干涉;合成波长;CPLD;纳米位移测量;信号处理:TP274.2:A0,[1],,[2][3][4][5][67]16;1000,;,;1000,,;,[8],440000,,,,CPLD,,,ns,,CPLD,,11,12BS,1BS,PBSM11,PBS2,D1;2BS,PBSM2,M1,PBS2,D221,,12,2,s,12:Kdiv=2s(1)l:l=KdivL=2sL(2):s=12/(1-2),LM1:0.6328mHeNe,!=1070MHz,s=c!280mm,c,(1)Kdiv=2s=0.632810-628010-31440000,,,22.1CPLD,1D1,D2,,CPLD,,RS232C,PC,,PC222.2CPLD,3,LM324,3.2kHz,100kHzLM339,LM3390.4s/0.5s,240201027,,,,,,LM339,,,3,AlteraMAX7000sEPM7128SLC8415,200MHz,CPLDAlteraQuartus!,,EDIFVHDL,EDA,Quartus!EDAMAX232DB9,CPLDPC,2.3CPLDD(d_latch)(jianxiangchufaqi)(fenpin)(counter_compare)(transfer)CPLD44:(ref)(mea)D,refmea;clk,,,,control,,PCa)4,clk,16,,,241第2期:CPLD,refmea,clk,q1dec[0],dec[0]dec[1],notdec[0]dec[1]qb),10,,8,[9],116,5x_idle()x_start()x_wait()x_shift()x_stop()xcnt16,xbitcnt,xmit_cmd(reset),x_idle,xmit_cmd(),x_start,16(xcnt16=∀1111#)x_waitx_wait16,8(xbitcnt=∀0111#)x_stopx_shiftx_shift,x_waitx_stopxmit_cmd,,52.41PC,VisualBasic,VBMSCommCPLDPC,,,,,673,(25∃0.3%)(70%∃3%)Renishaw1GHML10HeNe;M2PhysikInstrumenteP752.1CDPZT,15m,0.1nm;M1PhysikInstrumenteM531,306mm,0.2m510nm5nm89:0~200nm,0.9991,1.85nm10nm1011,,0~200nm,0.9998,2.54nm,,,2422010274CPLD,,CPLD5nm10nm,,:[1],,,.[J].,2004,33(1):2426.[2],,.[J].,1999,25(3):7377.[3].[M].:,1999:294295.[4],,.[J].,1994,(4):57.[5].0.8328mmHeNe[D].:,1995.[6],,.[J].,2004,17(3):371374,406.[7],,.[J].,2002,29(5):4951.[8].[D].:,2005.[9].VerilogHDLASIC[M].:,2008:227.(258)243第2期:CPLDStudiesofAntireflectionPropertiesofSiCThinFilmsPreparedbyPECVDZHANGRuili1,DUHongwen2,ZHANGYaping1,DUPingfan1,WENMingliang1,ZHANGXiufang1,XIZhenqiang1(1.MaterialsEngineeringCenter,ZhejiangSciTechUniversity,Hangzhou310018,China;2.ZhejiangInstituteofMechanical&ElectricalEngineeringHangzhou310053,China)Abstract:Inthiswork,theorthogonaldesignmethodisusedtostudytheeffectofdepositionparametersofPECVDSiCthinfilmsontheantireflectionperformance.Also,effectofthedifferentdepositionparametersonthedepositionrateandrefractiveindexofSiCthinfilmisstudied.ItisfoundthatsubstratetemperatureisthemajorfactorthataffectstheperformanceofSiCthinfilms.ThegrowthrateofthinfilmsdecreasedasthesubstratetemperatureandflowratioofSiH4toCH4increased.Therefractiveindexofthinfilmsincreasedwithincreasingsubstratetemperature,whiletheflowratioofSiH4toCH4haslittleinfluenceontherefractiveindex.Keywords:PECVD;SiCthinfilms;orthogonalexperiment;antireflectionperformance(:)(243)SignalProcessingMethodoftheLaserSyntheticWavelengthInterferometryBasedonCPLDZHANGPing,YANLiping,YANGTao,CHENBenyong(NanometerMeasurementLab,ZhejiangSciTechUniversity,Hangzhou310018,China)Abstract:Thelasersyntheticwavelengthinterferometricnanodisplacementmeasurementisintroduced.AsignalprocessingsystemforthemeasurementbasedonComplexProgrammableLogicDevice(CPLD)isdesigned,includingthedesignofsignalpreprocessingcircuitandCPLDprocessingmodule.APCsoftwareisalsodesignedthattheMSCommActiveXofVisualBasicisusedtorealizethecommunicationbetweenPCandCPLDmodule,anditcanmonitortheexperimentinrealtime.Undertheconditionofconstanttemperatureandhumidity,displacementmeasurementexperimentswith5nmand10nmdeplacementincrementarecarriedout.Theexperimentalresultsshowthatthelinearcorrelationcoefficientis0.9991and0.9998withthestandarddeviationsof1.85nmand2.54nmoverarangeof200nm,respectively.Thisdemonstratesthatthedesignedsystemhashighreliabilityandpracticability.Keywords:laserinterferometer;syntheticwavelength;CPLD;nanodisplacementmeasurement;signalprocessing(:)258201027