SiO2溶胶稳定性的正交试验

261Vol.26No.120063JOURNALOFLIAONINGUNIVERSITYOFPETROLEUM&CHEMICALTECHNOLOGYMar.2006:1672-6952(2006)01-0030-04SiO2,,3(,113001):(TEOS),,,-,(EtOH)pH(DMF),,,,,DMF,,,,:;;:O648.14:AOrthogonalTestResearchoftheSiO2SolStabilityWANGXing-li,QIUGuo-min,ZHANGKe-zheng3(SchoolofPetrochemicalTechnology,LiaoningUniversityofPetroleum&ChemicalTechnology,FushunLiaoning113001,P.R.China)Received11October2005;revised10November2005;accepted5December2005Abstract:Thesilicasolisakindofcolloidsolution,silicadropdispersinginwaterorsolvents.Silicasolwaspreparedbysol-gelmethodfromtetraethoxysilane(TEOS)withtheethanolassolventanddilutehydrochloricascatalyst.OrthogonaltestwasusedtostudytheeffectsonsilicasolstabilitysuchasthemoleratioofwaterandTEOS,themoleratioofEtOHandTEOS,pH,themoleratioofDMFandTEOSandthetemperature.Theeffectsoftheabovefactorscanbeusedtocontrolthesilicasolstability.TheresultsshowthatthemoleratioofEtOHandTEOSexhibitssignificanteffectonthesilicasolstability,thesilicasolstabilityincreaseswiththeincreasingmoleratioofEtOHandTEOS.ThenextisthemoleratioofDMFandTEOS.DFMmakesgelationtimebecomelong.Theothereffectsareleast.Theeffectoftemperatureistheleast,solstabilitydecreaseswiththeincreasingtemperature.Keywords:Silicasol;Tetraethylsilicate;Orthogonaltest3Correspondingauthor.Tel.:[phone];fax:[phone];e-mail:[e-mail]-[1],(),,,,,,-:2005-10-11:(1980-),,,3,,[2][3];[4];[5]SiO2,,11.1HJ-4(),PHS-3B(),KQ-250()1.2(TEOS,),(EtOH,),N,N-(DMF,),(),1.3,(,pH,,(45)1.4-SiO2,,pH(DMF),DMFL16(45)11A:n(H2O)/n(TEOS)B:n(EtOH)/n(TEOS)C:n(HCl)/n(TEOS)D:n(DMF)/n(TEOS)E:t/1380.0102028200.040.830310400.071.645413600.102.46022.145()22,:BDACE,,DMP,28,40,0.07,0,602.211,,-[2],131.SiO24,,,7,,,,2ABCDE/d1111111421222220313333234144441952123412622143207234123582432127931342910324312011331242812342132013414235144231430154324111164413221119.0010.0020.7524.7518.00223.5022.5015.7520.0021.25319.2524.2522.2519.0017.00416.7521.7519.7514.7522.25R6.7514.256.5010.005.252.3,,,2,,,[6],,,,,2.4,pH[7],TEOS,,pH(4),pH[8],,H+TEOSOR,OR,,Cl-Si2+TEOS,OHSiO2.5DMF(DryingControlChemicalAdditives),,DMF4,DMF,DMF,,DMF,(),,DMF,,DMF,,[9]2.655,2326,,,,,,,[1],.-[J].,1992,12(2):56-63.[2]SchwartzRW,VoigtJA.Controlofthinfilmprocessingbehaviorthroughprecursorstructuralmodifications[R].US:Departmentofenergy,1998.[3],.[J].,2005,25(1):1-4.[4],,,.-SiO2[J].,2002,24(1):66-67.[5],,,.[J].,2003,29(6):642-645.[6],,.[M].:,1998:56-108.[7].[M].:,1997:105-164.[8],,,.-SiO2[J].,2002,24(1):64-67.[9],.-[J].,1993,12(6):60-65.(Ed.:ZZH,Z)331.SiO2