SEMI P5.2-94 STANDARD FOR PELLICLES FOR USE IN “G”

SEMIP5.2-94©SEMI1986,19961SEMIP5.2-94N/A©SEMI1986,1996STANDARDFORPELLICLESFORUSEIN“G”,“H”,and“I”LINEEXPOSURESYSTEMS1ScopeThisspecificationincludesthecharacteristicsofpelliclesforuseing(436nm),h(405nm),andi(365nm)lineexposuresystems.2Shape,Size,andStandoffofPellicle2.1Shape—Thisisdeterminedbyagreementbetweentheuserandsupplier.2.2Size—Thisisdeterminedbyagreementbetweentheuserandsupplier,butexpressionoftoleranceisasfollows:Outerdiametertolerance:+0,-xInnerdiametertolerance:+x,-02.3Standoff—6.3mmand4.0mmshouldbestan-dard.Tolerance:+0,-x3FilmCharacteristics3.1PolymerFilms3.1.1Type—AR-coatedornonAR-coated.3.1.2ExposureWavelength—g,h,and/orilines.3.1.3OpticalTransmissionRate—Therearethefol-lowingtwotypesdependingonopticaltransmissionrateatincidentangleof90°fromsurfaceofpellicleatthespecifiedwavelength(s).3.1.4Thickness—Thisisdeterminedbyagreementbetweentheuserandsupplier.3.1.4.1ThicknessConformity—±0.2μmmaximum.3.1.4.2ThicknessUniformity3.1.4.3FilmThickness3.1.5MechanicalStrength—Therequirementsforairblowaredeterminedwithinrangesshownbelow:Theairblowgunshouldbeused.TypeMinimumARCoated99percentNonARCoated98percentAirpressure:≤2.1kgf/cm2(atinputoftheairblowgun).Nozzlediameteroftheairblowgun:≤2mm.Distancebetweenthenozzletipandthefilm:≥25mm.4DefectLimits4.1MaximumdefectlimitsbasedonthepelliclestandoffandthenumericalapertureofthegiventypeofexposuresystemaregiveninTable1.Anydeparturefromthesedefectlimitsshallbeagreedtobetweentheuserandsupplier.5Requirements5.1FilmAdhesive—Filmmustbesealedontheentiretopoftheframe.Sealwithaminimumof50%oftheframewidthatanylocation.5.2FrameAdhesive—Frameadhesivemustbecon-tinuousandallownogapsbetweenpellicleframeandadhesive,andbetweenadhesiveandphotomaskafterattachment.Nopartoftheframeadhesivemayextendbeyondtheframewall,anditsedgesmustbefreeofvisuallydetectablestringers(andparticles).Adhesiveshouldformacompletesealbetweentheframeandthemaskoveraminimumof60%ofthewidthoftheframe.5.3Frame—Pellicleframemusthavenovisuallydetectablemachiningburrs,discontinuitiesinanodiza-tion,orparticles.5.4LightResistance—Thisisexpressedbytotalexposureenergyvalue(mj/cm2orj/cm2)ofspecifiedwavelengthonpellicle'sfilmuntildropping0.5%ofopticaltransmission(rate)atspecifiedwavelength.Also,thetestconditions(halfbandwidthofexposurespecifiedwavelength,energyofexposurespecifiedwavelength,exposureconditions,andothers)mustbeclear.2SEMIP5.2-94©SEMI1986,1996NOTICE:Thesestandardsdonotpurporttoaddresssafetyissues,ifany,associatedwiththeiruse.Itistheresponsibilityoftheuserofthesestandardstoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.SEMImakesnowarrantiesorrepresentationsastothesuitabilityofthestandardssetforthhereinforanypar-ticularapplication.Thedeterminationofthesuitabilityofthestandardissolelytheresponsibilityoftheuser.Usersarecautionedtorefertomanufacturer’sinstruc-tions,productlabels,productdatasheets,andotherrele-vantliteraturerespectinganymaterialsmentionedherein.Thesestandardsaresubjecttochangewithoutnotice.Theuser’sattentioniscalledtothepossibilitythatcompliancewiththisstandardmayrequireuseofcopyrightedmaterialorofaninventioncoveredbypatentrights.Bypublicationofthisstandard,SEMItakesnopositionrespectingthevalidityofanypatentrightsorcopyrightsassertedinconnectionwithanyitemmentionedinthisstandard.Usersofthisstandardareexpresslyadvisedthatdeterminationofanysuchpatentrightsorcopyrights,andtheriskofinfringe-mentofsuchrights,areentirelytheirownresponsibil-ity.Table1.MaximumDefectLimitsCharacteristicsMax.No.AllowableSizeCountedforMax.No.AllowableNon-removableParticlesNone20μmPinholesNonelimitofdetectionScratchesNoneWidth20μmDirtNonelimitofdetectionCopyrightbySEMI®(SemiconductorEquipmentandMaterialsInternational)805EastMiddlefieldRoad,MountainView,CA94043.ReproductionofthecontentsinwholeorinpartisforbiddenwithoutexpresswrittenconsentofSEMI.