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--0.1mg/L(Si)(Ge)(GaAs)(InP)(GaN)(SiC)[1][2][3][4]GB8978-1996[5]0.5mg/LDB31/374-2006[6]0.3mg/LDB11/307-2013[7]0.1mg/L1[3]45t/dpH70~80mg/L1Table1Waterquantityandqualityofarsenicwastewaterbetreatedbeforeandafter45.0t/d45.0t/dCODCr200mg/L100mg/LSS500mg/L70mg/L80mg/L0.1mg/LpH8~126~921GaAspHFig.1Arsenicwastewatertreatmenttechnologicalprocess-AsUF50m3/d5m3/hAs0.1mg/LpH=6~91pHpHpH45m3UPS2.1100m2~32h4m3Q=2m3/h,H=30m,2.2pH45m3pH2.5m3pHH2SO4NaOHpH2.3-[8]2.3.1As()As()[9-12]As()As()As()10As()5[13]pHAs()As()As()As()pH[14]2pH250.1mg/LFig.2AsionprofileunderdifferentpH(25,[As]=0.1mg/L)pH=4~14As()pH10As()pH7pH5~7.5As()[15]As()As()60As()As()[16]As()As()[17,18]NaClOAs()As()H2SO4NaOHpH5~7.52.3.2-pHFe(OH)3[Fe(H2O)6]3+[Fe2(OH)3]3+[Fe2(OH)3]4+[19][20]pH79Fe/As495As[21]As()As()PAM30minAs()As()95%,As0.5mg/LGB8978-19962.49008005m3/h8m/h0.6MPaNaHSO32.50.1nm-1nm0.5nm-5nm5nm-50nm0.1-10um3Fig.3Concalorimeter[22]0.05m150,0000.1~0.5MPa15m3/hPLC2.6Cl[23]:2RCl+HAsO42-R2HAs04+2C1-R2HAs04+2NaC12RC1+Na2HAs04[24]201D301AsAs0.01mg/LAs()As()As()As()3120.1mg/L34[1],.[J].,2014,26(5):74-78[2]HuS,CresswellJV,BrymanDA,KwokHL.Lightabsorptioninaresistive-gateGaAscharge-coupleddevice[J].JVacSciTechnol,2000,18(2):582587.[3].[J].,2011,3(1):26-31[4]JefferLA,RobertSF,ChristopherTD.Environmentaltoxicants[J].PriorityHealthConditions,1993:77.[5]GB8978-1996[S].:,1996.[6]DB31/374-2006[S].:,2006.[7]DB11/307-2013[S].:,2006.[8].[D].:,2013.[9]HeringJG,ChenP,JA,etal.Arsenicremovalfordrinkingwaterduringcoagulation[J].EnvironmentalEngineeringScience,1997,123:800-807.[10]HeringJG,ChenPY,WilkieJA,etal.Arsenicremovalbyferricchloride[J].JournalAmericanWaterWorksAssociation,1996,88(4):155-167.[11]ChengRC,LiangS,WangHC,etal.Enhancedcoagulationforarsenicremoval[J].AmericanWaterWorksAssociation,1994,86(9):79-90.[12]TokunagaS,YokoyamaS,WasaySA.RemovalofArsenic(III)andArsenic(V)compoundsfromaqueoussolutionswithlanthanum(III)salt,andcomparisonwithaluminum(III),calcium(III)andiron(III)salts[J].WaterEnvironmentResearch,1999,71:299-306.[13].LED[D].:,2012.[14]KabayN,BundschuhJ,HendryB,etal.TheGlobalArsenicProblem:ChallengesforSafeWaterProduction.2nded.London:CRCPress/Balkema,2010.[15]PetersonJ.ManagingArsenicinGaAsFabWastewater:proceedingsof11thAnnualIEEE/SEMIAdvancedSemiconductorManufacturingConferenceandWorkshop,Boston,MA,September12-14,2000.NewYork:IEEE,2000:187-195.[16],,,.[J].,2010(9):102-107.[17]SorliniS,GialdiniF.Conventionaloxidationtreatmentsfortheremovalofarsenicwithchlorinedioxide,hypochlorite,potassiumpermanganateandmonochloramine[J].WaterResearch,2010,44(19):5653-5659.[18]DoddMC,VuND,AmmannA,etal.KineticsandmechanisticaspectsofAs()oxidationbyaqueouschlorine,chloroamines,andozone:Relevancetodrinkingwatertreatment[J].EnvironmentalScience&Technology,2006,40:5750-5756.[19].[J].2002,22929-31.[20].--[J].2010,3131-4.[21]HeringJG,ChenPY,WilkieJA,etal.Arsenicremovalbyferricchloride[J].JournalAmericanWaterWorksAssociation,1996,88(4):155-167.[22].[J].,2015,34(4):1-5.[23]GuoH,StD,BernerZ,etal.Characteristicsofarsenicadsorptionfromaqueoussolution:Effectofarsenicspeciesandnaturalabsorbents[J].AppliedGeochemistry,2009,24(4):657-663.[24],,.[J].,2010,31(4):94-96.
本文标题:某半导体芯片生产项目含砷废水处理方案
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