紫外光_电子束_UV_EB_固化的应用现状与发展前景_吕延晓 一至十四 合集 56页

151Vo.l15,No.1200716FineandSpecialtyChemicals:紫外光/电子束(UV/EB)固化技术的商业化应用始于20世纪60年代,并很快以其独特的技术优势广泛应用于涂料油墨和胶粘剂等领域经过40多年的发展,UV/EB固化技术的应用也日新月异,具有非常广阔的市场前景本刊曾在2006年第19期报道过辐射固化的产业化及市场动态为了让更多的科研工作者了解并参与到这个新兴的产业中,促进我国辐射固化产业的发展,本刊自2007年第1期开始增设辐射固化专栏,并特别邀请到中国感光学会辐射固化专业委员会前任常务副理事长兼秘书长中国核科技信息与经济研究院吕延晓研究员主持本栏目的内容/(UV/EB)()吕延晓(中国核科技信息与经济研究院,北京100037)/(UV/EB)2060BayerUV,UV,EB,,UV/EB,UV/EB,,,(),UV/EB,UV/EB,UV/EB,,UV/EB(),UV/EB,,1UV/EB,UV/EB,:()UVEB,,X,400nm40nm,30~30(eV)2~8eV,UV,EB,EB30~300keVEB30keV,1000,EB,,UV,,UV()130m,()50m100~300keV,500m,29151400m,UV/EB,,:UV/EB,UV/EB:(VOC),,1UVEB,UVEB10,,1UVEBUVEB()VOC:,UV/EB,,,1,UV/EBUV/EBUVEB,UV/EBUV/EB,UV/EB,UV/EB1UV/EB,UV/EBUV/EB,UV/EB,UV/EB,(),2UV/EBUV/EB40,,,,,UV/EB,UV/EB,,,,,2.1UV/EB,UV/EB,,,,230200716:/(UV/EB)a.()b.()22005UV/EB()2.1.1涂料UV/EB,,,UVUVUVUVUV,UV()UVUV,,,,,,,UV;UV,;,UVUVUVUV,,,UVUVUV,(120~140),,,,,UVUV,()UV2.1.2油墨UV/EBUV/EB,UV/EB1%~2%UV/EB,UV,UV/EB4(),(PCB)UVUVUVUVUV2.1.3胶粘剂UV/EBUV/EB,UV/EB,,,2.2UV/EBUVEB101,UVEB,,UV,UV,,EB31151,EBUV,,(),EB,,EB(),EB(UV5%~10%),,EB,,EBEB800,400(55%),300()(38%),50~60(7%);,;EB,;()2.3UV/EB,UV/EB,23UV(),44%,42%,8%,4%,2%2UVPVC()()()(),3UV/%44428422.4UV/EB,,UV/EB,,UV/EB,3UV/EB76%(),,46%,35%81%,UV/EB,33%,20%,16%70%,UV(EB),UV44%,(26%)(13%),()()UV/EBUV/EB,UVUV,UV,,,UV/EB(未完待续)32152Vo.l15,No.22007121FineandSpecialtyChemicals/(UV/EB)()吕延晓(中国核科技信息与经济研究院,北京100037)(上接本刊第1期)2.5UV/EB,UV/EB,UV/EB2.5.1木材,()(),()UV/EB,UV-,,,UV,,UV,2.5.2纸张,90%(),,,,,(PET),,,UV/EB,(),,,UV/EB,UV/EB,UVUV,UV2.5.3塑料,,;:(PS)(PMMA)(PVC)(PE)(PP)(PET)(PC)ABS,,,,UV/EB,#31#152UV/EB,UV/EB,,,,,,,UV(),2.5.4金属,UV/EB/0,,,,()UV()UV/EB()UV,UV,UV,UV/EB2.5.5其他基材,,,,,,,UV,,UV/EB,,,()UV,UV,UV,UV/EB,UV,UV/EB()(),UV/EB,,()(),UV/EB,,(1min),,,UV/EB3UV/EB,UV/EB,UV/EB:,(PCB);UVEB;,UVUV,#32#2007121:/(UV/EB)()UVEB,UV;,UV,;,UVEB;UVEB;UV;PVC,UVEB();EB,?1mmUV,UV/EB,(stickers)UV/EB;UV,UV/EB,UV;UV;UV,UVEBUV/EBUV/EB;UV;UV,EB;EB(casting);UVEB;,,UV/EB;,UV;,,,UVEB;,EBUV,UVEB;UV;,10UV/EB,UV/EB,,UVUV/EB,/INVISIBLEBUTEVERYWHERE(,)03:¹UV/EB/0,,UV/EBºUV/EB,,,/0,UV/EB»UV/EB,/0UV/EB3%~5%,UV/EB1%4UV)))4.1,(NC)(PU),(VOC),,UVUVUV2060UV,#33#152,UV,()UV(10~20m/min),,,,(145e,),,UVUV,,,4,UVAUV,54UV2005/kg4150~93150~45~145150~335(UA)4~2815(UA)/5~225()5~77()715~1510~123~1423~5820~6022~402150~41801175~31502~38~155~105~113~92~75~74.2UVUVUVUVUV,UV(veneerfloorparquetfloor)UVUV,5UVt200120042009/%(2004~2009)13080146001940061200170027001072010001800121500017300239003500040000*450002~3800073007410013:*4t3tUV,(1t)UV4.2.1按施工要求分类UV,,,,,UV,,UV,,,UVUV,,,,UV,,UV,,UV,UVUVUV,,UVUVUVUVUVUV,,UV,,,,,t(未完待续)#34#153/4Vo.l15,No.3/4200726FineandSpecialtyChemicals/(UV/EB)()吕延晓(中国核科技信息与经济研究院,北京100037)(上接本刊第2期)4.2.2按使用场合与质量要求分类UV,,,()3UV3UVUV,,6UVUV,,,6UV(g/m2)40~150()4~25013~4Pa#s()20~60013~1Pa#s()60~20040~60s(DIN4)30~15015~25s(DIN4)UV,UV4UVUV,UVUV,,UV(CO2)UV,4UV#33#153/45UV,,UV5CO2UV413UVUV,2070,UV(IAEA)EB,,,UV/EB,90,,UV,UV1998UVPVC200(),UV,,,,,,,,,UV,()UV200414490,tUV5UV/EBUV/EB,:/,0UV/EB)))(EB)UV/EBUV(EB),,,,,UV/EB/0/0,,,,511UVUV1969,UVUVUV2090UV,,UV;UV;UV;UV;UV,UV(60%~65%),(10%~15%)(10%),,UV,()(),#34#200726:/(UV/EB)()/0(shee-tfedoffsetlithographypress)(weboffsetlithographypress)6,;,,UV,,,6UVUV,12000/h400m/min,()/0,,,,UV20,,UVUV,UV,UV)))UV,(150~200m/min),UVUV512EBEBUV21,EB,,300keV80~110keV,,,30~50g/m2EB,,,,7,EBEBEB,,,,7EBEB;(continuousstationeryanddirectmailjobs);;,;,EB,,EB#35#153/4,(wettrapping)EB,EB,EBEB,,EB,,513UV/EBUV/EB40~50,UV/EB,75%~80%,8%~10%UV/EB7,2004UV/EB114,t215~2175,115%5,UV/EBUV/EB,5%UV/EB,8UV/EBUV/EB20043,t31%,20%,18%,11%,2005UV/EBUV/EB9t(未完待续)7UV/EB2001/t/%2004/t/%2009/t/%2004~2009/%168904720840473360054101100031140003218000295(0~20,)8070229030211085017317359601004387010062450100)8UV/EB2001/t/%2004/t/%2009/t/%2004~2009/%19200572140055314006081350040160004119000373~486531270416503514335651003867010052050100)92005UV/EBUV/EB/kg()15~2515~2713~19()21~3328~3420~4016~1916~3718~5518~2816~3517~276~227~216~19#36#155Vo.l15,No.5200736FineandSpecialtyChemicals/(UV/EB)()吕延晓(中国核科技信息与经济研究院,北京100037)(上接本刊第3/4期)6UV,UV/EB,UV,,)))UVUV(IC),,UV,2UV/EBIC,(LCD)(PDP),,6.1()()(photoresists)UV/EB,,,,UV()EBX6.1.1集成电路的UV光刻加工,,(LSI)(ULSI)(IC)UV,(Lm),(100nm),LSIULSIUV,,,(UV)(),UV88UV(1Lm)(mask)UV#29#155,UV;,()(MOS)(),1969IntelGordonMoor,18,,(CPU),4004(1971),23002002PentiumIVNorthwordCPU5500,UV,436nm(g)365nm(d)248nn(KrF,DUV)193nm(ArF)157nm(F2)1014nm()1nm(X),20,UV1Lm,UV10UV015Lm,UVUV0123Lm,245nmUV0118LmUV011LmUV(K)1/3,ReyleighUV,:UV(),,,193nmArF,()(NA)(),,(PSM)(OPC)(OAI),45nm-32nm-22nmUV,248nm,0125Lm,256M;193nm(ArF),0115Lm,1G,,4G157nm(F2),UV1010UV/LmIC/DRAM1970121K1975516K19802256K19841121M19860184M199001516M1995013564M19980123256M200101181G200401134G2007011016G2010010764G6.1.2X射线与电子束蚀刻加工6.1.2.1X射线X(011~5nm)XUV:X,UV#30#200736:/(UV/EB)(),X,50mm@50mmX,UVX,X,,()()(PMMA)(-1-)(PBS)(COP)(FClBS)X,XX(SOR)X()(VUV)XX103~105X100X,SOR,,X,X6.1.2.2电子束(EB)(20~200keV),XX,,X,,,011Lm0125Lm,,,,,,(ULSI),,,,(),011Lm,116LC/cm2;(),011Lm,10LC/cm2,011Lm,0107Lm,5LC/cm2,,,LB,138LB,,10nm6.1.2.3离子束,,UVX,(0105Lm),6.1.3光致抗蚀剂的市场动态6.1.3.1国际市场,,(PCB)(LCD)(PDP),#31#155,,,11112002/%27101610Sumitom