飞秒激光精密微纳加工的研究进展

35(2006)8http:PP­(100080).,.,,..,,,Femtosecondlasermicro2nanofabricationZHUJiang2FengWEIZhi2Yi­(KeyLaboratoryofOpticalPhysics,InstituteofPhysics,ChineseAcademyofSciences,Beijing100080,China)AbstractGreatinterestisfocusedonfemtosecondlasermicro-nanofabricationduetotheultra-shorttimescaleandultra-highpeakpowerdensitycharacteristicsofthefemtosecondlasers.Veryhighresolutionandaccu2racycanbeachievedwhenworkingwithrigidmaterialsandliquidresin.InthispaperWeintroducetheprogressoffemtosecondlaserprecisemicro-nanofabrication.Twodifferentfabricationmechanismsaredescribedinclu2dinglaserablationandtwophotopolymerization.Finally,theprospectoffemtosecondlaserfabricationisdis2cussed.Keywordsfemtosecondlaser,micro2nanofabrication,ablation,twophotopolymerization3(:60490280,60225005,1022401)(:KJXC-SW-W14)2005-12-16,2006-02-02­.Email:[e-mail]1(),.,.,,.,,[1][2](MEMS)[3][4].,,.,,(pho2tolithography)[5].,(embossingorimprinting)[6],(injectionmolding)[7],(EMM)[8](ultrasonicmachining)[9].,.,,..,976chttp:PP()().10111012W/cm2,1020W/cm2,1021W/cm2,,.,.,.,[10][11,12],[13][14][15],.:(ablation)(twophotopoly2merization).,(QNd:YAG)[16,17].,,,.,(two2photonphotochromism),[18,19].2(QNd:YAG),,,:,,,(),1m,.,.,..2.1(ablation)(rigidmaterials),(dielectrics)[20][13,21,22][16,2325].1.11,,10Hz100kHz,[1113,2124].(ND),.X-Y,(PZT).,,.,,.Dong[21],,,.,,,.08635(2006)8http:PP(condensation)(decomposition),-(defect-activation).,,,,,.2.2,,,.,[26],,.,.,.,.2.2,,.,,,.,.,,.,.,,.Sun[14].,150fs,780nm,76MHz.NA=1.4.(SCR500,JSR),,.3(SEM).3(SEM)310m,7m,120nm,.,,.,.,;,,,.,,;,;,..,,.,.Fukushima[27]-(Au)SiO2/TiO2,;Duan[28](Ti)(urethaneacrylate),TiO2186chttp:PP[29].,.Konorov[19]spiropyran(PM2MA),(pho2tochromism).,.,,,[18].3,.,,.,,:;;.3.1,,,,.,,.,,,.,,10Hz100kHz,,,;,,100MHz,.,,,,()[30].,,,[31].,[24].,,,,,X.800nm.,BBO(387nm)Si-SiO2[11,12],(400nm)[32].,,,,.3.2,,,,,,.,.,,.3.3,,,,,.100nm,:?,,.4,,,28635(2006)8http:PP[1]JacobsonSC,HergenroderR,KoutnyLBetal.Anal.Chem.,1994,66:1107[2]AnanchenkoGS,BagryyanskayaEG,TarasovVFetal.Chem.Phys.Lett.,1996,255:267[3]KovacsGTA,PetersenK,AlbinM.Anal.Chem.,1996,68:407[4]LeeSS,LinLY,WuMC.Appl.Phys.Lett.,1995,67:2135[5]QinD,XiaYN,RogersJAetal.TopicsinCurrentChemis2try,1998,194:1[6]ChouSY,KraussPR,RenstromPJ.Science,1996,272:85[7]EmmeliusM,PawlowskiG,VollmannHW.Angrew.Chem.Int.Ed.Engl,1989,28:1445[8]DattaM.J.Electrochem.Soc.,1995,142:3801[9]TechnicalReport,BullenUltrasonicsInc.,Eaton,Ohio,1995[10]MinoshimaK,KowaleviczAM,HartlIetal.Optics&PhotonicsNews,2003,4449[11]LiM,LiuXB.Jpn.J.Appl.Phys.,2001,40:3476[12]LiM,IshizukaM,LiuXBetal.Opt.Commu.,2002,212:159[13]BorowiecA,HaugenHK.Appl.Phys.A,2004,79:521[14]KawataS,SunHB,TanakaTetal.Nature,2001,412:697[15]JiangZW,ZhouYJ,YuanDJetal.Chin.Phys.Lett.,2003,20:2126[16]VarelH,AshkenasiD,RorenfeldAetal.Appl.Phys.A,1997,65:367[17]ZengDW,LiK,YungKCetal.Appl.Phys.A,2004,78:415[18]LecomteS,GublerU,JagerMetal.Appl.Phys.Lett.,2000,77:921[19]KonorovSO,FedotovAB,ZheltikovAM.Appl.Phys.B,2003,76:707[20]LenznerM,KrugerJ,KautekWetal.Appl.Phys.A,1999,68:369[21]DongY,MolianP.Appl.Phys.A,2003,77:839[22]OzonoK,ObaraM,UsuiAetal.OptCommu.,2001,189:103[23]TaylorRS,HnatovskyC,SimovaEetal.Opt.Lett.,2003,28:1043[24]ZhengHY,ZhouW,QianHXetal.Appl.Surface.Science,2004,236:114[25]RanA,LiY,GongQHetal.Chin.Phys.Lett.,2004,21:2465[26]DemtroderW.LaserSpectroscopyBasicConceptsandInstru2mentation.Springer-Verlag,1982.333[27]FukushimaM,YanagiH,HayashiSetal.Physica.E.,2004,21:456[28]DuanXM,SunHB,KanekoKoshiroetal.ThinSolidFilms,2004,453:518[29]LuoL,LiCD,WangSFetal.J.Opt.A:Pure.Appl.Opt.,2001,3:489[30]OstendorfA,KulikC,BarschN.ProceedingsoftheICALEO.Jacksonville,USA,October1316,2003.p.A20A28[31]TonshoffHK,OstendorfA,WnagerT.SPIEProc.,2001,4274:88[32]GuoHC,JiangHB,YangHetal.Chin.Phys.Lett.,2003,20:682386