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ArvydasSurvilaElectrochemistryofMetalComplexesRelatedTitlesGileadi,E.PhysicalElectrochemistryFundamentals,TechniquesandApplications2011PrintISBN:978-3-527-31970-1;alsoavailableinelectronicformatsSchlesinger,M.,Paunovic,M.(eds.)ModernElectroplating5thEdition2010PrintISBN:978-0-470-16778-6;alsoavailableinelectronicformatsEndres,F.,MacFarlane,D.,Abbott,A.(eds.)ElectrodepositionfromIonicLiquids2008PrintISBN:978-3-527-31565-9;alsoavailableinelectronicformatsArvydasSurvilaElectrochemistryofMetalComplexesApplicationsfromElectroplatingtoOxideLayerFormationTheAuthorProf.Dr.ArvydasSurvilaCenterforPhysicalSciences&TechnologyGoštautostr.901108VilniusLithuaniaAllbookspublishedbyWiley-VCHarecarefullyproduced.Nevertheless,authors,editors,andpublisherdonotwarranttheinformationcontainedinthesebooks,includingthisbook,tobefreeoferrors.Readersareadvisedtokeepinmindthatstatements,data,illustrations,proceduraldetailsorotheritemsmayinadvertentlybeinaccurate.LibraryofCongressCardNo.:appliedforBritishLibraryCataloguing-in-PublicationDataAcataloguerecordforthisbookisavailablefromtheBritishLibrary.BibliographicinformationpublishedbytheDeutscheNationalbibliothekTheDeutscheNationalbibliothekliststhispublicationintheDeutscheNationalbibliografie;detailedbiblio-graphicdataareavailableontheInternetat©2015Wiley-VCHVerlagGmbH&Co.KGaA,Boschstr.12,69469Weinheim,GermanyAllrightsreserved(includingthoseoftranslationintootherlanguages).Nopartofthisbookmaybereproducedinanyform–byphotoprinting,microfilm,oranyothermeans–nortransmittedortranslatedintoamachinelanguagewithoutwrittenpermissionfromthepublishers.Registerednames,trademarks,etc.usedinthisbook,evenwhennotspecificallymarkedassuch,arenottobeconsideredunprotectedbylaw.PrintISBN:978-3-527-33877-1ePDFISBN:978-3-527-69126-5ePubISBN:978-3-527-69125-8MobiISBN:978-3-527-69127-2oBookISBN:978-3-527-69124-1TypesettingLaserwordsPrivateLimited,Chennai,IndiaPrintingandBindingMarkonoPrintMediaPteLtd,SingaporePrintedonacid-freepaperVContentsPrefaceIXSymbolsandAbbreviationsXIII1Introduction11.1EquilibriumPropertiesofComplexSystems21.1.1GeneralDefinitions21.1.2EquilibriumintheSolutionsofComplexCompounds31.1.3DistributionofComplexesandLigandsintheSolution6References122EquilibriumElectrodePotentials132.1ElectrodesoftheFirstKind142.2EquilibriaInvolvingIonsoftheIntermediateOxidationState182.3ElectrodesoftheSecondKind222.4Open-CircuitPotentials:ExamplesofExperimentalInvestigations252.4.1SystemCu/Cu(I),CN−252.4.2SystemCu/Cu(II),β-Alanine29References313MassTransport333.1TwoModelsofLinearMassTransport353.2OtherCasesofDiffusionalMassTransport393.3MassTransportofChemicallyInteractingParticles413.4ConcentrationProfiles443.4.1ConcentrationProfilesinIdeallyLabileSystems453.4.2ConcentrationProfilesinSystemsofLimitedLability52References584PeculiaritiesofElectrochemicalProcessesInvolvingLabileComplexes614.1Steady-StateVoltammograms624.2PotentialTransients68VIContents4.3CurrentTransients69References745QuantitativeModelingofQuasi-ReversibleElectrochemicalProcessesInvolvingLabileComplexesofMetals755.1KineticEquations765.2EmploymentofVoltammetricData805.2.1TafelPlotsNormalizedwithRespecttotheSurfaceConcentrationofEAC805.2.2AnalysisofLPSCurrentMaxima835.3TechniquesBasedontheControloftheIntensityofForcedConvection855.3.1IsosurfaceConcentrationVoltammetry855.3.2DeterminationoftheExchangeCurrentDensityfromPolarizationResistance865.3.3ElectrochemicalImpedanceSpectroscopy(EIS)underForcedConvectionConditions89References936DeterminationofMechanismofElectrochemicalProcessesInvolvingMetalComplexes976.1DeterminationoftheMechanismbyReactionOrders986.2MethodofIsopotentialSolutions100References1027Adsorption1057.1ThermodynamicAspects1067.2ModelAspects108References1128ElectrochemicalProcessesinRealSystems1158.1ExperimentalDetails1158.2CyanideSystems1168.2.1SystemCu|Cu(I),CN−1178.2.2SystemAg|Ag(I),CN−1198.2.3SystemAu|Au(I),CN−1258.3EcologicalSystemsContainingHydroxyAcids1318.3.1ElectroreductionofCu(II)Complexes1328.3.2ElectroreductionofSn(II)Complexes1518.3.3ElectroreductionofZn(II)Complexes170Appendix174References1749ElectrochemicalDepositionofAlloys1839.1MassTransportduringtheCodepositionofMetals184ContentsVII9.2CodepositionofCobaltandTin1859.3DepositionofBrassCoatings1949.4DepositionofBronzeCoatings2059.4.1SurfaceActivityofPolyethersonCopperandTinSubstrates2069.4.2EffectofHalides.FormationofSurfaceComplexes2119.4.3EffectofLengthoftheHydrocarbonChain2149.4.4CodepositionofCopperandTin2179.4.5RelatedPhenomena:CurrentOscillations2239.5CodepositionofCobaltandMolybdenum227References23410SpontaneousFormationofPhotosensitiveCuprousOxideLayers24110.1TwoMechanismsofCu2OFormation24210.2CompositionofOxideLayers24310.3KineticsofCu2OFormation24410.4ElectrochemicalReductionofOxideLayers24610.5PhotoelectrochemicalPropertiesofOxideLayers25110.6PhotoelectrochemicalStabilityofOxideLayers25510.7InfluenceofOxideLayersonKineticsofCu(II)Reduction258References26311HydrogenEvaluationInvolvingLigandsasProtonDonors267References276ConcludingRemarks277Index283IX
本文标题:ElectrochemistryofMetalComplexesApplications
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