Facility Gas Cabinet Cylinder Change OI

SemiconductorManufacturingInternationalCorporationDoc.No.:Doc.Title:FacilityGasCabinetcylinderchangeOIRev.:0PageNo.:1/8TheinformationcontainedhereinistheexclusivepropertyofSMIC,andshallnotbedistributed,reproduced,ordisclosedinwholeorinpartwithoutpriorwrittenpermissionofSMIC.Accordingto:DocumentControlProcedure;AttachmentNo.:;Rev.:0DocumentLevel:(ForEngineering&QualityDocument/工程暨品质文件专用)Level1-ManualLevel2–Procedure/SPEC/ReportLevel3-OperationInstructionSecurityLevel:Security1-SMICConfidentialSecurity2-SMICRestrictedSecurity3-SMICInternalDocumentChangeHistoryRev.EffectiveDateAuthorChangeDescription02006-10-18SZ_WangInitiateSemiconductorManufacturingInternationalCorporationDoc.No.:Doc.Title:FacilityGasCabinetcylinderchangeOIRev.:0PageNo.:2/8TheinformationcontainedhereinistheexclusivepropertyofSMIC,andshallnotbedistributed,reproduced,ordisclosedinwholeorinpartwithoutpriorwrittenpermissionofSMIC.Accordingto:DocumentControlProcedure;AttachmentNo.:;Rev.:01.Title:GasCabinetcylinderchangeOI2.Purpose:TosupplyeverykindofspecialgasfromVMBorVMPtoPOUoftoolscontinuouslyandsafely.3.Scope:3.1Appliedequipment:Alltoolswhichusespecialgas.3.2SubjectContent:HPI(V1)HighPressureIsolationvalveThishigh-pressurevalveisolatestheprocessgaspigtailfromthepanel,providingaHigh-pressureshutdownfeature.HPV(V2)HighPressureVentvalveThislow-pressurevalveisolatestheventurivacuumgeneratorfromtheprocessgaspigtail.PGI(V3)PurgeGasIsolationvalveThishigh-pressurevalveisolatestheprocessgaspigtailfromthepurgegaspigtail.VVS(V4)VenturiVacuumSupplyvalveSemiconductorManufacturingInternationalCorporationDoc.No.:Doc.Title:FacilityGasCabinetcylinderchangeOIRev.:0PageNo.:3/8TheinformationcontainedhereinistheexclusivepropertyofSMIC,andshallnotbedistributed,reproduced,ordisclosedinwholeorinpartwithoutpriorwrittenpermissionofSMIC.Accordingto:DocumentControlProcedure;AttachmentNo.:;Rev.:0Thislow-pressurevalveopenstoallownitrogentoflowthroughtheventurisoastocreatethevacuumforpurgingthepanel.LPV(V5)LowPressureVentvalveThislow-pressurevalveservesthedualfunctionofcontrollingthelow-pressureventingofthesystempriortopurge.PGC(V6)PurgeGasCyclevalveThislow-pressurevalvecontrolsthesupplyofultrahighpurity(UHP)nitrogenduringthepurgeprocedure.Thisvalveistheonlyvalvecyclingduringthecyclepurgesequence.PLI(V7)ProcessLineIsolationvalveThislow-pressurevalveisolatesthepanelfromtheprocesslinetoprotecttheprocesstool.PGB(V8)PurgeGasBleedvalveThislow-pressurevalvecontrolsthepurgegasbleedflowforanymaintenancefunctionofthepanel.Itmaintainsaminimumflowduringthecylinderchangeouttocontinuouslypurgethecylinderconnection.ASO(V9)AutoSwitchOvervalveThislow-pressureprocessvalvecontrolsthedeliveryoftheprocessgastotheprocessline.Itcontrolswhichpanelwilldelivergastotheprocessline.ACV(V10)AutomaticCylinderValveThishigh-pressurepneumaticvalvecontrolsthesupplyofprocessgasfromthecylinder.Thisvalveislocatedonthecylinderandcanbemanuallylockedshut.TAP(V11)TestAccesPortValve(onlyPH3andSiH4paneluse)EFSExcessFlowSwitchSPTSupplyPressurtTransducerDPTDeliveryPressureTransducerHPLHighPressureLeakTestGasInlet(onlyPH3andSiH4paneluse)3.3Location:Inertgasroom,Toxic/Flammablegasroom,CorrosivegasroomandPyrophoricgasroominFab11,Fab11SubfabSemiconductorManufacturingInternationalCorporationDoc.No.:Doc.Title:FacilityGasCabinetcylinderchangeOIRev.:0PageNo.:4/8TheinformationcontainedhereinistheexclusivepropertyofSMIC,andshallnotbedistributed,reproduced,ordisclosedinwholeorinpartwithoutpriorwrittenpermissionofSMIC.Accordingto:DocumentControlProcedure;AttachmentNo.:;Rev.:04.Nomenclature:Gascabinet5.Reference:ThegascabinetoperationmanualofALS6.Responsibility:FacilityGassectionshiftengineer&TGMteam7.机台操作:7.1操作步骤:参见GasCabinetcylinderchangeOIflowchart.GascabinetcylinderchangeOIFlowChartackalarmIflowpurgepressurethencheckpurgegassupplyPresspurgeButtonandselectleftorrightcylinderpurgecylinderauto-switchalarmInputcylinderpurgepasswordPanelstopped.Panelpurge,presscontinueClosecylindervalve&Lockcylindervalve,presscontinuePurgeventline.Wait…ProcessgasventingTransducerzeroing.Wait…TobecontinuedSemiconductorManufacturingInternationalCorporationDoc.No.:Doc.Title:FacilityGasCabinetcylinderchangeOIRev.:0PageNo.:5/8TheinformationcontainedhereinistheexclusivepropertyofSMIC,andshallnotbedistributed,reproduced,ordisclosedinwholeorinpartwithoutpriorwrittenpermissionofSMIC.Accordingto:DocumentControlProcedure;AttachmentNo.:;Rev.:0CloseG/CdoorandremoveSCBACylindervalveseatleaktest.Wait…Cylinderleaktestok.Pre-purgecycling.Wait…Pre-purgecomplete.Removecylinder?PressyesRemovecylinder.(AccordingG/CchecklistanduseSCBAifthegasisnotinertgas.)Cylinderremoved.Connectnewcylinder.presscontinue.Lowintegrityleaktest.Wait…ContinuedTobecontinuedSemiconductorManufacturingInternationalCorporationDoc.No.:Doc.Title:FacilityGasCabinetcylinderchangeOIRev.:0PageNo.:6/8TheinformationcontainedhereinistheexclusivepropertyofSMIC,andshallnotbedistributed,reproduced,ordisclosedinwholeorinpartwithoutpriorwrittenpermissionofSMIC.Accordingto:DocumentControlProced